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Publication Date
Spring 2025
Department
Physics
Description
Low-temperature plasma reactors used for chip fabrication involve complex physical processes that affect the quality of pattern transfer on the semiconductor substrate. Detailed investigations of the near-surface plasma environment require fully-kinetic approaches. We use a particle-in-cell/Monte Carlo collision (PIC/MCC) approach coupled with external circuitry to model realistic operating conditions capture the kinetic effects and measure ion energy and angle distribution functions. We build on the exascale-capable PIC/MCC code, WarpX, and leverage Python interfaces to couple external circuitry. In this talk, we will demonstrate this inexpensive, non-iterative coupled strategy using a two-dimensional Gaseous Electronics Conference reference cell.
Keywords
Plasma reactors, Chips, Semiconductors; Monte Carlo Collision
Digital Publisher
Digital Commons at St. Mary's University
Collection
Research Showcase Presentations -2025
Format
Medium
Presentation
City
San Antonio, Texas
Creative Commons License
This work is licensed under a Creative Commons Attribution-NonCommercial-No Derivative Works 4.0 International License.